This forum is intended for questions about kinetics, Surface Plasmon Resonance and the instruments related to these techniques.
Baseline shows continuous increase in response even with buffer injection
- Madhu
- Topic Author
- Offline
- New Member
-
17 hours 24 minutes ago #1
by Madhu
Baseline shows continuous increase in response even with buffer injection was created by Madhu
Recently in T200 we are facing a problem with all established assay and its irrespective of chemistry or protein.
There is continuous increasing drift in the baseline for every cycle of injection, initially we doubted on protein aggregation, regeneration but this happens irrespective of chip surface, protein interaction.
Even a buffer injection is causing the increase in the baseline continually, currently we are trying to check if its the CM5 matrix issue or the instrument issue. Meanwhile all the system check shows pass result .
Anyone seen this kind of issue or any input for resolving please respond
thank you
There is continuous increasing drift in the baseline for every cycle of injection, initially we doubted on protein aggregation, regeneration but this happens irrespective of chip surface, protein interaction.
Even a buffer injection is causing the increase in the baseline continually, currently we are trying to check if its the CM5 matrix issue or the instrument issue. Meanwhile all the system check shows pass result .
Anyone seen this kind of issue or any input for resolving please respond
thank you
Please Log in or Create an account to join the conversation.
Moderators: Arnoud